Abelardo M Santos

Title: The Innovative Contributions of Abelardo M Santos

Introduction

Abelardo M Santos is a notable inventor based in Englewood, NJ (US). He has made significant contributions to the field of imaging technology, particularly in the development of methods for creating high-resolution resist patterns.

Latest Patents

One of his key patents is titled "Method of imaging resist patterns of high resolution on the surface of a conductor." This innovative method involves forming an electrostatic latent image in a desired pattern on an electrostatically imageable surface. The image is then toned with a liquid toner to create a toner image on the surface. This toner image can be transferred while still wet to a transfer sheet and subsequently to the surface of a conductor. Alternatively, the toner image may be directly transferred to the conductor's surface, which is the preferred method. The toner image is then fused to the conductor surface, resulting in a high-resolution etch resist pattern. This process allows for the etching of the conductor to create high-density printed circuits. Abelardo M Santos holds 1 patent for this innovative method.

Career Highlights

Abelardo M Santos is associated with Olin Hunt Specialty Products Inc., where he continues to contribute to advancements in imaging technology. His work has been instrumental in enhancing the quality and precision of printed circuit manufacturing.

Collaborations

Throughout his career, Abelardo has collaborated with notable colleagues, including David P Bujese and Peter J Calabrese. These collaborations have further enriched his contributions to the field.

Conclusion

Abelardo M Santos is a distinguished inventor whose innovative methods have significantly impacted the imaging technology landscape. His patent for high-resolution resist patterns exemplifies his commitment to advancing technology in this field.