Crestwood, KY, United States of America

Aaron Coppernoll

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016-2017

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2 patents (USPTO):Explore Patents

Title: Innovations of Aaron Coppernoll

Introduction

Aaron Coppernoll is an accomplished inventor based in Crestwood, Kentucky. He has made significant contributions to the field of chemical engineering, particularly in the preparation of organohalosilanes and halosilanes. With a total of two patents to his name, Coppernoll's work showcases his expertise and innovative approach to chemical processes.

Latest Patents

Coppernoll's latest patents include a method for preparing a halosilane and a method for preparing an organohalosilane. The first patent outlines a two-step process for creating a reaction product by contacting a silane with a spinel catalyst at high temperatures. This method allows for the preparation of diorganodihalosilanes from silicon tetrahalides. The second patent describes a two-step process involving a copper catalyst and halogenated silanes to form organohalosilanes, demonstrating his innovative approach to chemical synthesis.

Career Highlights

Throughout his career, Coppernoll has worked with notable companies such as Dow Corning Corporation and Dow Silicones Corporation. His experience in these organizations has contributed to his development as a leading inventor in his field. His work has not only advanced the understanding of chemical processes but has also led to practical applications in various industries.

Collaborations

Coppernoll has collaborated with talented individuals such as Catharine Horner and Krishna Janmanchi. These partnerships have fostered a creative environment that has led to innovative solutions and advancements in their respective fields.

Conclusion

Aaron Coppernoll's contributions to the field of chemical engineering through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

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