Corning, NY, United States of America

A Renee Sutton


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of A Renee Sutton in Fused Silica

Introduction

A Renee Sutton is an accomplished inventor based in Corning, NY, known for his innovative work in the field of material science. With a keen focus on producing high purity glass materials, Sutton has made significant strides in the industry through his unique methods and applications.

Latest Patents

Sutton holds one notable patent titled "Method of making titania-doped fused silica." This invention pertains to the production of high purity fused silica glass doped with titania using titanium chelates. The patent highlights useful chelates such as titanium acetylacetonate and titanium ethyl acetoacetate, which contribute to the quality and purity of the fused silica glass produced.

Career Highlights

A Renee Sutton is associated with Corning Incorporated, a leading company in the specialty glass and ceramics sector. His work has propelled advances in the production techniques associated with fused silica, showcasing his expertise in this niche area. His dedication to innovation reflects the core values of Corning Incorporated, which strives to pioneer new glass technologies.

Collaborations

Throughout his career, Sutton has collaborated with notable colleagues including Jeffrey L Blackwell and David Dasher. These partnerships have played a crucial role in further enhancing research and development efforts within Corning Incorporated, allowing for the exchange of ideas and expertise.

Conclusion

In conclusion, A Renee Sutton's contributions to the field of fused silica through his patent highlight the innovative spirit that drives advancements in material science. His work and collaborations at Corning Incorporated are a testament to the importance of innovation in creating high-quality materials that meet modern technological demands.

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