Company Filing History:
Years Active: 1999
Title: A-Hon Kwon: Innovator in Gas Concentration Adjustment
Introduction
A-Hon Kwon is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of gas concentration adjustment, particularly in environments that require low oxygen levels for scientific testing.
Latest Patents
Kwon holds a patent for a gas concentration adjusting agent and method. This innovative agent allows for the convenient creation of low oxygen concentration environments, which are essential for testing cultured cell damage caused by low oxygen. The patent describes a system that utilizes a gas concentration adjusting agent composed of water, a carbon dioxide absorbent, and an ascorbic acid-based, carbon dioxide-generating type of oxygen-absorbing composition. This agent is designed to maintain oxygen concentrations at no more than 1% and carbon dioxide concentrations between 3 and 7% during the culture of cells in sealed containers.
Career Highlights
A-Hon Kwon is affiliated with Mitsubishi Gas Chemical Company, Inc., where he continues to develop innovative solutions in gas concentration management. His work has implications for various scientific and medical applications, particularly in cell culture and research.
Collaborations
Kwon has collaborated with notable colleagues, including Hisaya Araki and Tomoo Kamiya, to advance research and development in his field.
Conclusion
A-Hon Kwon's contributions to gas concentration adjustment technology highlight his role as an important inventor in the scientific community. His innovative solutions are paving the way for advancements in cell culture and research methodologies.