The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 1999
Filed:
Mar. 25, 1997
Hisaya Araki, Tokyo, JP;
A-Hon Kwon, Osaka, JP;
Tomoo Kamiya, Osaka, JP;
Yoshihiko Harima, Tokyo, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
A gas concentration adjusting agent which allows a low oxygen concentration environment, such as an ischemic environment for tests of cultured cell damage caused by low oxygen or the like, to be conveniently created, as well as a method and a system for adjusting gas concentrations using this easily handled agent, are provided. During the culture of cultured cells under low oxygen-ischemic culture conditions in a sealed container, the gas concentration adjusting agent consisting of water, a carbon dioxide absorbent, and an ascorbic acid-based, carbon dioxide-generating type of oxygen-absorbing composition is sealed inside the sealed container, so as to adjust the oxygen concentration in the culture environment to no more than 1% and the carbon dioxide concentration to between 3 and 7%.