Portland, OR, United States of America

A Daniel Feller


Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 102(Granted Patents)


Company Filing History:


Years Active: 1997-2006

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10 patents (USPTO):Explore Patents

Title: A Daniel Feller: Innovator in Chemical Mechanical Polishing

Introduction

A Daniel Feller is a notable inventor based in Portland, OR (US), recognized for his contributions to the field of chemical mechanical polishing. He holds a total of 10 patents, showcasing his innovative approach to enhancing polishing processes in semiconductor manufacturing.

Latest Patents

Feller's latest patents include significant advancements in polishing slurries. One of his inventions is an abrasive slurry designed for polishing a first material with a hardness less than that of a second material. This innovative slurry allows for effective polishing of copper over a copper diffusion barrier, utilizing materials such as iron oxide and strontium titanate. Another notable patent involves a high pH slurry for copper polishing, which operates within a pH range of 7.5 to 12. This slurry formulation includes a silicon oxide abrasive and a corrosion inhibitor, enabling a high polish rate while minimizing damage to the substrate.

Career Highlights

Feller is currently employed at Intel Corporation, where he applies his expertise in developing advanced polishing solutions. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Feller has collaborated with esteemed colleagues, including Kenneth C Cadien and Anne E Miller, contributing to the advancement of polishing technologies.

Conclusion

A Daniel Feller's innovative work in chemical mechanical polishing has led to significant advancements in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and enhancing product quality.

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