Newark, CA, United States of America

Risk Management Solutions, Inc.

Calculating rank
USPTO Granted Patents = 17

% Expired Patents = 47.1


Trademarks = 18

Forward Citations = 53

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31 inventors (with patents filed for the assignee):

goldMedal David Carttar (4 out of 4 patents)

silverMedal Christof Bornhoevd (3 out of 43 patents)

bronzeMedal Han Chen (3 out of 3 patents)

4.  Weimin Dong (3 out of 3 patents)

5.  Andrew Coburn (3 out of 3 patents)

6.  Christopher George (2 out of 2 patents)

7.  Jordan Byk (2 out of 2 patents)

8.  Christopher Sams (2 out of 2 patents)

9.  Monalisa Samal (2 out of 2 patents)

10.  Surender Kumar (2 out of 2 patents)

11.  Julien Brown (2 out of 2 patents)

12.  Valli Gadiyaram Venkata (2 out of 2 patents)

13.  Shruthi Bhat (2 out of 2 patents)

14.  David Glaubman (2 out of 2 patents)

15.  Horst Werner (2 out of 33 patents)


17 patents:

Company Overview
Risk Management Solutions, Inc. specializes in providing advanced risk modeling and analytics solutions, primarily focusing on natural disasters and climate-related risks. The company develops software and data services that enable organizations to assess and manage risks associated with catastrophic events, helping clients make informed decisions in risk management. Headquartered in Newark, California, RMS serves a global clientele across various sectors, including insurance, reinsurance, and government agencies, leveraging cutting-edge technology to enhance resilience against potential threats.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Nov 3 2026

17 Patents

#25 in Newark, CA

#4,521 in California

#18,914 in US

#35,987 in the World

Newark, CA (US)
Newark, CA, United States of America
Forward Citations = 53

31 inventors:

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Risk Management Solutions, Inc.. Retrieved from https://idiyas.com/company/risk-management-solutions

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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