For the Inventor, By the Inventor

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Hudson, NH, United States of America

Presstek, Inc.

USPTO Granted Patents = 161

% Expired Patents = 18.0

EPO Patents = 11

Trademarks = 13

Forward Citations = 1,603

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67 inventors (with patents filed for the assignee):

Thomas E Lewis (63 out of 68 patents)

Richard A Williams (32 out of 39 patents)

Michael T Nowak (28 out of 32 patents)

4. John F Kline (26 out of 28 patents)

5. John P Gardiner (17 out of 20 patents)

6. Frank G Pensavecchia (16 out of 18 patents)

7. Ernest W Ellis (15 out of 45 patents)

8. John Gary Sousa (14 out of 14 patents)

9. Sonia Rondon (12 out of 13 patents)

10. Kevin Ray (12 out of 14 patents)

11. Douglas D Fuller (8 out of 11 patents)

12. Thomas P Rorke (8 out of 9 patents)

13. Richard J D'Amato (8 out of 9 patents)

14. Kenneth T Robichaud (8 out of 9 patents)

15. Kenneth R Cassidy (7 out of 7 patents)

Core Competencies:

Ablation-Type Printing

Lithographic Members

Dry Imaging Techniques

Exposure Sensitivity

Plate Cleaning

Web Handling

Metal-Based Printing

Laser Imaging

Performance Layers

Permeability-Transition Layers

Infrared Laser-Imageable

Multicolor Printing

161 patents: Sort by Forward Citations

1. 10124571 - Ablation-type lithographic printing members having improved exposure sensitivity and related methods (2018-11-13),

2. 10011137 - Dry lithographic imaging and printing with printing members having aluminum substrates (2018-07-03),

3. 9827759 - Dry printing with simplified plate cleaning (2017-11-28),

4. 9605150 - Recording media and related methods (2017-03-28),

5. 9555615 - Ablation-type lithographic imaging with silicone acrylate layers (2017-01-31),

6. 9387660 - Ablation-type lithographic printing members having improved shelf life and related methods (2016-07-12),

7. 9387659 - Ablation-type lithographic printing members having improved exposure sensitivity and related methods (2016-07-12),

8. 8967043 - Ablation-type lithographic printing members having improved exposure sensitivity and related methods (2015-03-03),

9. 8875629 - Ablation-type lithographic imaging with enhanced debris removal (2014-11-04),

10. 8685623 - Lithographic imaging and printing without defects of electrostatic origin (2014-04-01),

11. 8652758 - Lithographic imaging and printing with printing members having fusible polymeric particles (2014-02-18),

12. 8512481 - Press cleaning with low-VOC solvent compositions (2013-08-20),

13. 8389199 - Lithographic imaging with printing members having metal imaging bilayers (2013-03-05),

14. 8198010 - Lithographic imaging with printing members having hydrophilic, surfactant-containing top layers (2012-06-12),

15. 8173346 - Printing members having permeability-transition layers and related methods (2012-05-08),

Company Overview

Presstek, Inc. is a leading provider of lithographic imaging solutions, specializing in advanced printing technologies. Based in Hudson, NH, the company focuses on developing and manufacturing innovative products such as ablation-type printing systems and lithographic members. Their expertise extends to dry imaging techniques, exposure sensitivity, plate cleaning, and web handling, catering to the evolving needs of the printing industry. Presstek's commitment to metal-based printing and laser imaging positions it as a key player in enhancing print quality and efficiency.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

161 Patents

#1 in Hudson, NH

#16 in New Hampshire

#2,464 in US

#5,122 in the World

Hudson, NH, United States of America

Presstek, Inc.

Forward Citations = 1,603

67 inventors:

Thomas E Lewis (63 out of 68 patents)

Richard A Williams (32 out of 39 patents)

Michael T Nowak (28 out of 32 patents)

4. John F Kline (26 out of 28 patents)

5. John P Gardiner (17 out of 20 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Presstek, Inc.. Retrieved from https://idiyas.com/company/presstek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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