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USPTO Data Jan 1 1976 - Oct 13 2026
22 Patents
#1 in Jeppo
#158 in Finland
#28,782 in the World
Kwh Mirka Ltd
Forward Citations = 244
16 inventors:
Kwh Mirka Ltd
% Expired Patents = 4.5
EPO Patents = 1
Trademarks = 4
Forward Citations = 244
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16 inventors (with patents filed for the assignee):
Hans Hede (9 out of 17 patents)
Göran Höglund (6 out of 11 patents)
Goran Hoglund (5 out of 13 patents)
4. Mats Sundell (5 out of 12 patents)
5. Markus Kass (3 out of 3 patents)
6. Beatriz Meana-Esteban (3 out of 3 patents)
7. Stig Finnäs (3 out of 11 patents)
8. Antti Laukkanen (1 out of 27 patents)
9. Stefan Lindvall (1 out of 3 patents)
10. Beatriz Esteban (1 out of 1 patent)
11. Pelle Reinius (1 out of 7 patents)
12. Christer Kavander (1 out of 2 patents)
13. Ronny Klemets (1 out of 2 patents)
14. Kim Nylund (1 out of 1 patent)
15. Stig Finnaes (1 out of 1 patent)
22 patents:
4. 10076826 - Method to provide an abrasive product surface and abrasive products thereof (2018-09-18),
Company Overview
Kwh Mirka Ltd, based in Jeppo, Finland, specializes in the development and manufacturing of advanced surface finishing solutions. The company is renowned for its innovative products in the abrasives sector, catering to various industries including automotive, marine, and woodworking. Mirka's commitment to research and technology drives the creation of high-performance tools and materials, enhancing efficiency and quality in surface treatment processes. Their focus on sustainability and user-friendly designs positions them as a leader in the global market.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Kwh Mirka Ltd. Retrieved from https://idiyas.com/company/kwh-mirka
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
1 patent (EPO):
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]