Company Badge
USPTO Data Jan 1 1976 - Oct 13 2026
11 Patents
#63 in Auburn Hills, MI
#964 in Michigan
#27,514 in US
#51,761 in the World
Form Rite Corporation
Forward Citations = 266
15 inventors:
Auburn Hills, MI, United States of America
Form Rite Corporation
Forward Citations = 266
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15 inventors (with patents filed for the assignee):
Christopher J Kargula (5 out of 7 patents)
William E Stevens (3 out of 4 patents)
Michael R Miller (3 out of 3 patents)
4. Perry J Rea (3 out of 3 patents)
5. Dennis G Kinder (2 out of 3 patents)
6. Dietmar Roloff (1 out of 2 patents)
7. Matthew David Lutzke (1 out of 1 patent)
8. Frank Dean Hawley (1 out of 4 patents)
9. Richard A Sager (1 out of 2 patents)
10. Gary T Iler (1 out of 1 patent)
11. Alan S Gilroy (1 out of 1 patent)
12. Dennis C Gaida (1 out of 1 patent)
13. Richard V Spiegel (1 out of 1 patent)
14. Klaus Straszewski (1 out of 1 patent)
15. Michael Schieb (1 out of 1 patent)
11 patents:
Company Overview
Form Rite Corporation, based in Auburn Hills, Michigan, specializes in advanced manufacturing solutions, particularly in the realm of custom tooling and precision components. The company is known for its expertise in designing and producing high-quality molds and fixtures that cater to various industries, including automotive and aerospace. With a focus on innovation and efficiency, Form Rite leverages cutting-edge technology to enhance production processes and meet the evolving needs of its clients.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Form Rite Corporation. Retrieved from https://idiyas.com/company/form-rite
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]