Windham, NH, United States of America

Contour Design, Inc.


USPTO Granted Patents = 22

% Expired Patents = 4.5


Trademarks = 5

Forward Citations = 143

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17 inventors (with patents filed for the assignee):

goldMedal Steven Wang (19 out of 22 patents)

silverMedal Les Scenna (9 out of 9 patents)

bronzeMedal Andrew David Morgan (5 out of 7 patents)

4.  James Bleck (3 out of 45 patents)

5.  Thomas Eagan (3 out of 27 patents)

6.  Jonathan Towle (3 out of 18 patents)

7.  Anton Khinchuk (3 out of 3 patents)

8.  William D Chura (3 out of 10 patents)

9.  Scott H Wakefield (3 out of 54 patents)

10.  Leslie Scenna (3 out of 11 patents)

11.  John Aho (2 out of 25 patents)

12.  HanNing Lu (2 out of 3 patents)

13.  Changjun Zhao (2 out of 3 patents)

14.  ZhiJian Huang (2 out of 2 patents)

15.  Chad C Terry (2 out of 14 patents)


22 patents:

Company Overview
Contour Design, Inc. is a technology company based in Windham, New Hampshire, specializing in ergonomic input devices and accessories designed to enhance user comfort and productivity. The company focuses on developing innovative solutions for various sectors, including professional and personal computing. With a commitment to improving the user experience, Contour Design integrates advanced design principles and user feedback into its product development, ensuring that its offerings meet the evolving needs of consumers and professionals alike.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

Contour Design, Inc. USPTO Patent Assignee Logo
22 Patents

#2 in Windham, NH

#101 in New Hampshire

#15,051 in US

#28,807 in the World

Windham, NH (US)
Windham, NH, United States of America
Forward Citations = 143

17 inventors:

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Contour Design, Inc.. Retrieved from https://idiyas.com/company/contour-design

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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