Company Badge
USPTO Data Jan 1 1976 - Nov 10 2026
6 Patents
#20 in Lawrenceville, NJ
#1,676 in New Jersey
#45,102 in US
Applied Color Systems, Inc.
Forward Citations = 75
12 inventors:
Lawrenceville, NJ, United States of America
Applied Color Systems, Inc.
Calculating rank
Trademarks = 2
Forward Citations = 75
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12 inventors (with patents filed for the assignee):
Joseph M Reed (2 out of 2 patents)
Stephen B Maguire (1 out of 79 patents)
Lev Rapoport (1 out of 5 patents)
4. Donald R Hall (1 out of 17 patents)
5. David Slocum (1 out of 10 patents)
6. Leonard D Butler (1 out of 1 patent)
7. Stephen M Dallas (1 out of 1 patent)
8. Peter A Ruevski (1 out of 1 patent)
9. James T DeGroff (1 out of 2 patents)
10. Philip R Worn (1 out of 1 patent)
11. Ralph A Stanziola (1 out of 1 patent)
12. Danny C Rich (1 out of 1 patent)
6 patents:
Company Overview
Applied Color Systems, Inc. is a leading provider of color management solutions for the printing and packaging industry. With innovative technology and expert team, ACS delivers precise color matching, quality control, and workflow optimization to help clients achieve superior printing results. Their advanced software and hardware solutions are trusted by top brands worldwide.
Profile summary synthesized from public USPTO records and patent filings.
IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Applied Color Systems, Inc.. Retrieved from https://idiyas.com/company/applied-color-systems
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]