The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Sep. 18, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Hendrik Jan De Jong, The Hague, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01); G03F 7/00 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); H01L 21/6776 (2013.01); H01L 21/67173 (2013.01); H01L 21/67706 (2013.01); H01L 21/67724 (2013.01); H01L 21/67748 (2013.01); H01L 21/67778 (2013.01); H01L 21/683 (2013.01); H01L 21/687 (2013.01); H01L 21/6838 (2013.01); H01L 21/6875 (2013.01); H01L 21/68707 (2013.01); H01L 21/68742 (2013.01); H01L 21/68785 (2013.01); Y10T 29/49815 (2015.01); Y10T 29/49998 (2015.01); Y10T 29/53 (2015.01);
Abstract
The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.