The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2022

Filed:

Nov. 11, 2019
Applicant:

Wolfspeed, Inc., Durham, NC (US);

Inventors:

Van Mieczkowski, Apex, NC (US);

Jonathan Young, Fuquay-Varina, NC (US);

Qingchun Zhang, Cary, NC (US);

John Williams Palmour, Cary, NC (US);

Assignee:

WOLFSPEED, INC., Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2005.12); H01L 29/06 (2005.12); H01L 29/16 (2005.12); H01L 29/66 (2005.12); H01L 21/04 (2005.12); H01L 21/02 (2005.12); H01L 29/47 (2005.12); H01L 29/739 (2005.12); H01L 29/744 (2005.12);
U.S. Cl.
CPC ...
H01L 29/872 (2012.12); H01L 21/022 (2012.12); H01L 21/045 (2012.12); H01L 29/0619 (2012.12); H01L 29/0692 (2012.12); H01L 29/1608 (2012.12); H01L 29/6606 (2012.12); H01L 29/47 (2012.12); H01L 29/7395 (2012.12); H01L 29/744 (2012.12);
Abstract

A Schottky diode is disclosed that includes a silicon carbide substrate, a silicon carbide drift layer, a Schottky contact, and a passivation structure. The silicon carbide drift layer provides an active region and an edge termination region about the active region. The Schottky contact has sides and a top extending between the two sides and includes a Schottky layer over the active region and an anode contact over the Schottky layer. The passivation structure covers the edge termination region, the sides of the Schottky contact, and at least a portion of the top of the Schottky contact. The passivation structure includes a first silicon nitride layer, a silicon dioxide layer over the first silicon nitride layer, and a second silicon nitride layer over the silicon dioxide layer.


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