The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2011

Filed:

Feb. 09, 2006
Applicants:

John P. Fallon, Andover, MA (US);

Richard L. Sandstrom, Encinitas, CA (US);

William N. Partlo, Poway, CA (US);

Alexander I. Ershov, Escondido, CA (US);

Toshihiko Ishihara, San Diego, CA (US);

John Meisner, San Diego, CA (US);

Richard M. Ness, San Diego, CA (US);

Paul C. Melcher, El Cajon, CA (US);

John A. Rule, Hingham, MA (US);

Robert N. Jacques, San Diego, CA (US);

Inventors:

John P. Fallon, Andover, MA (US);

Richard L. Sandstrom, Encinitas, CA (US);

William N. Partlo, Poway, CA (US);

Alexander I. Ershov, Escondido, CA (US);

Toshihiko Ishihara, San Diego, CA (US);

John Meisner, San Diego, CA (US);

Richard M. Ness, San Diego, CA (US);

Paul C. Melcher, El Cajon, CA (US);

John A. Rule, Hingham, MA (US);

Robert N. Jacques, San Diego, CA (US);

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/22 (2005.12);
U.S. Cl.
CPC ...
Abstract

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.


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