The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jan. 24, 2017
Tokyo Electron Limited, Tokyo, JP;
Ryota Sakane, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
The plasma processing apparatus includes a first electrode to which high frequency power is applied, a second electrode that functions as a counter electrode with respect to the first electrode, and a controller configured to control distribution of plasma generated between the first electrode and the second electrode. The first electrode is, for example, an upper electrode. The second electrode includes a lower electrode, and a peripheral portion disposed around the lower electrode. The peripheral portion includes a plurality of split electrodes divided in a peripheral direction. For each split electrode, the controller controls an impedance between the plasma and a ground via the split electrode.