The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2018

Filed:

Apr. 07, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Alexey Kuritsyn, San Jose, CA (US);

Alexander Bykanov, San Diego, CA (US);

Oleg Khodykin, San Diego, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F 23/00 (2006.01); G02B 27/00 (2006.01); H05G 2/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0006 (2013.01); G03F 7/70033 (2013.01); G03F 7/70175 (2013.01); G03F 7/70908 (2013.01); G03F 7/70933 (2013.01); H05G 2/003 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01); G01N 2223/204 (2013.01);
Abstract

The present disclosure is directed to a system for protecting a reflective optic and/or any other surface in a plasma-based illumination system from debris by actively flowing gas against the debris flow direction. According to various embodiments, a vacuum chamber is configured to contain a target material, wherein a laser or discharge produced plasma is generated in response to an excitation of the target material. One or more outlets within the chamber are configured to receive gas flowing from a fluidically coupled gas source and further configured to actively flow the gas towards a source of debris and away from the reflective optic or any other protected surface at a controlled flow rate.


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