The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Jun. 13, 2016
Sandisk Technologies Llc, Plano, TX (US);
Zhenyu Lu, Milpitas, CA (US);
Jixin Yu, Milpitas, CA (US);
Koji Miyata, Yokkaichi, JP;
Makoto Yoshida, Yokkaichi, JP;
Johann Alsmeier, San Jose, CA (US);
Hiro Kinoshita, Yokkaichi, JP;
Daxin Mao, Cupertino, CA (US);
SANDISK TECHNOLOGIES LLC, Plano, TX (US);
Abstract
A linear mark extending perpendicular to a primary step direction of stepped terrace for a three-dimensional memory device can be employed as a reference feature for aligning a trimming material layer before initiating an etch-and-trim process sequence. The linear mark can be formed as a linear trench or a linear rail structure. The distance between a sidewall of each trimming material layer and the linear mark can be measured at multiple locations that are laterally spaced apart perpendicular to the primary step direction to provide statistically significant data points, which can be employed to provide an enhanced control of the staircase patterning process. Likewise, locations of patterned stepped surfaces can be measured at multiple locations to provide enhanced control of the locations of vertical steps in the stepped terrace.