The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Aug. 29, 2014
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Tung-Heng Hsieh, Zhudong Town, TW;
Sheng-Hsiung Wang, Zhubei, TW;
Hui-Zhong Zhuang, Kaohsiung, TW;
Yu-Cheng Yeh, New Taipei, TW;
Tsung-Chieh Tsai, Chu-Bei, TW;
Juing-Yi Wu, Hsin-Chu, TW;
Liang-Yao Lee, Taoyuan, TW;
Jyh-Kang Ting, Baoshan Township, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A post placement abutment treatment for cell row design is provided. In an embodiment a first cell and a second cell are placed in a first cell row and a third cell and a fourth cell are placed into a second cell row. After placement vias connecting power and ground rails to the underlying structures are analyzed to determine if any can be merged or else removed completely. By merging and removing the closely placed vias, the physical limitations of photolithography may be by-passed, allowing for smaller structures to be formed.