The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Jun. 25, 2015
Asml Netherlands B.v., Veldhoven, NL;
Günes Nakiboglu, Eindhoven, NL;
Suzanne Johanna Antonetta Geertruda Cosijns, Casteren, NL;
Anne Willemijn Bertine Quist, Eindhoven, NL;
Lukasz Sosniak, Diepenbeek, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.