The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Jan. 20, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Norbert Wabra, Werneck, DE;
Robert Eder, Karlsruhe, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k−j| being an odd number.