The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Jun. 08, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Joerg G. Appinger, Boeblingen, DE;

Eberhard Dengler, Boeblingen, DE;

Roland Dieterle, Holzgerlingen, DE;

Martin Eckert, Boeblingen, DE;

Gabriele Kuczera, Boeblingen, DE;

Siegfried Tomaschko, Boeblingen, DE;

Otto Torreiter, Boeblingen, DE;

Quintino Lorenzo Trianni, Boeblingen, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 1/067 (2006.01); G01R 1/073 (2006.01); G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
G01R 1/06794 (2013.01); G01R 1/07307 (2013.01); G01R 31/2887 (2013.01); G01R 31/2891 (2013.01);
Abstract

A wafer probe alignment system and method for aligning a probe to a chip wafer for testing a chip on the wafer are provided. At least two corners of the probe are adjustable in a same direction in relation to a primary corner of the probe. The alignment approach includes providing a grid of signal pins for corresponding contact pads of the chip under test, determining for each signal pin whether an electrical contact is established to a corresponding contact pad of the chip under contact force, and adjusting a position of each of the at least two corners by a corner individual delta position value with respect to the direction depending on a result of the determining in order to establish an electrical contact between each of the pins and the corresponding contact pads of the chip under test.


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