The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Jan. 05, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daisuke Domon, Jyoetsu, JP;
Koji Hasegawa, Jyoetsu, JP;
Keiichi Masunaga, Jyoetsu, JP;
Masaaki Kotake, Jyoetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 212/14 (2006.01); C08F 220/30 (2006.01); G03F 7/038 (2006.01); C08F 220/24 (2006.01); C08F 220/18 (2006.01); C07C 381/12 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
C08F 212/14 (2013.01); C07C 381/12 (2013.01); C08F 220/18 (2013.01); C08F 220/24 (2013.01); C08F 220/30 (2013.01); G03F 1/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); C08F 2220/301 (2013.01); C08F 2500/03 (2013.01); C08F 2800/10 (2013.01);
Abstract
The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.