The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Jun. 08, 2016
Applicant:
Iv Technologies Co., Ltd., Taichung, TW;
Inventors:
Kun-Che Pai, Taichung, TW;
Yu-Hao Pan, Taichung, TW;
Assignee:
IV Technologies CO., Ltd., Taichung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/26 (2012.01); B24B 37/24 (2012.01);
U.S. Cl.
CPC ...
B24B 37/26 (2013.01); B24B 37/24 (2013.01);
Abstract
A polishing layer of a polishing pad is provided. The polishing layer of the polishing pad includes a carrier layer and a plurality of embedded sections. The embedded sections embedded in the carrier layer are located in a polishing surface of the polishing layer, wherein in the polishing surface of the polishing layer, a groove is included in the carrier layer between every two adjacent embedded sections.
Pai, Kun-Che. (2018). Polishing layer of polishing pad and method of forming the same and polishing method (U.S. Patent No. 9969049). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9969049
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile