The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Mar. 10, 2016
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Che-Yi Lin, Kaohsiung, TW;

En-Chiuan Liou, Tainan, TW;

Chia-Hsun Tseng, Tainan, TW;

Yi-Ting Chen, Kaohsiung, TW;

Chia-Hung Wang, Taichung, TW;

Yi-Jing Wang, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7003 (2013.01);
Abstract

A method of forming an integrated circuit includes the following steps. A substrate including a plurality of exposure fields is provided, and each of the exposure field includes a target portion and a set of alignment marks. Measure the set of alignment marks of each exposure field by a measuring system to obtain alignment data for the respective exposure field. Determine an exposure parameter corresponding to each exposure field and an exposure location on the target portion from the alignment data for the respective exposure field by a calculating system. Feedback the alignment data to a next substrate.


Find Patent Forward Citations

Loading…