The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Aug. 19, 2015
Applicant:

Freescale Semiconductor, Inc., Austin, TX (US);

Inventors:

Jean Philippe Laine, Saint Lys, FR;

Patrice Besse, Tournefeuille, FR;

Assignee:

NXP USA, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/62 (2006.01); H01L 29/72 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/74 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66371 (2013.01); H01L 27/0255 (2013.01); H01L 27/0259 (2013.01); H01L 27/0262 (2013.01); H01L 29/0642 (2013.01); H01L 29/7404 (2013.01); H01L 29/7424 (2013.01);
Abstract

An ESD protection structure comprising a first semiconductor region of a first doping type, a second semiconductor region of the first doping type, a semiconductor structure of a second doping type opposite to the first doping type formed to provide lateral isolation between the first and second semiconductor regions of the first doping type, and a first contact region of the second doping type formed within a surface of the second semiconductor region. A thyristor structure is formed within the ESD protection structure comprising the first contact region of the second doping type, the second semiconductor region of the first doping type, the semiconductor structure of the second doping type, and the first semiconductor region of the first doping type. Wherein no contact region is formed within a surface of the semiconductor structure of the second doping type between the first and second semiconductor regions of the first doping type.


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