The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Apr. 03, 2015
Applicant:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Inventors:
Morgan Evans, Manchester, MA (US);
Ross Bandy, Milton, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/66 (2006.01); H01J 37/30 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/265 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01); H01L 21/223 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 22/26 (2013.01); H01J 37/30 (2013.01); H01J 37/32935 (2013.01); H01J 37/32963 (2013.01); H01L 21/02104 (2013.01); H01L 21/265 (2013.01); H01L 21/3065 (2013.01); H01L 21/67253 (2013.01); H01J 2237/30 (2013.01); H01J 2237/334 (2013.01); H01L 21/2236 (2013.01); H01L 21/31116 (2013.01);
Abstract
An apparatus to control processing conditions for a substrate. The apparatus may include a current measurement component to perform a plurality of extraction current measurements for extraction current in a processing apparatus housing the substrate, the extraction current comprising ions extracted from a plasma and directed to the substrate; and an endpoint detection component comprising logic to generate an endpoint detection signal based upon a change in extraction current during the plurality of extraction current measurements.