The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Sep. 19, 2016
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventor:
Shifang Li, Pleasanton, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/28 (2006.01); G01B 11/06 (2006.01); G02B 27/00 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0608 (2013.01); G02B 21/0032 (2013.01); G02B 21/0096 (2013.01); G02B 27/0025 (2013.01); G01B 2210/56 (2013.01);
Abstract
A system includes a first beam splitter, a second beam splitter, and a mirror. The second beam splitter can produce two lines of light, which are received by at least one sensor. The two lines of light have different focal heights on the wafer. A distance between the second beam splitter and the mirror can be configured to change a focal height on the wafer. A height of an illuminated region on a surface of the wafer relative to a normal surface of the wafer can be determined using the two lines of light.