The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
May. 28, 2013
Kla-tencor Corporation, Milpitas, CA (US);
Haiming Wang, Fremont, CA (US);
Shankar Krishnan, Santa Clara, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Methods and systems for small angle CD metrology with a small spot size are introduced to increase measurement sensitivity while maintaining adequate throughput necessary for modern semiconductor manufacture. A small angle CD metrology system includes a small angle spectroscopic ellipsometry (SE) subsystem combined with a small angle spectroscopic reflectometry system, both operated at small angles of incidence. The small angle SE subsystem is configured to operate in a complete Mueller Matrix mode to further improve measurement sensitivity. The small angle CD metrology system includes an objective having all reflective surfaces in the light path. In some embodiments, the all-reflective objective is a Schwartzschild objective having an axicon mirror element to further reduce measurement spot size. In some embodiments, the small angle CD metrology system includes a dynamic aperture subsystem to isolate specific ranges of angles of incidence and azimuth for improved measurement sensitivity.