The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Jun. 02, 2017
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Aurélie Kuroda, Chofu, JP;

Shang Chen, Sagamihara, JP;

Takahiro Onuma, Tama, JP;

Dai Ishikawa, Ome, JP;

Assignee:

ASM IP HOLDING B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76888 (2013.01); H01L 21/76849 (2013.01); H01L 23/5226 (2013.01); H01L 23/53209 (2013.01); H01L 23/53228 (2013.01); H01L 23/53257 (2013.01);
Abstract

Processes are provided herein for protecting metal thin films from oxidation when exposed to an oxidizing environment, such as the ambient atmosphere. The processes may comprise a protective treatment including exposing the metal thin film to a silicon-containing precursor at a temperature of about 200° C. or less in order to selectively adsorb a silicon-containing protective layer on the metal thin film. The silicon-containing protective layer may reduce or substantially prevent the underlying metal thin film from oxidation.


Find Patent Forward Citations

Kuroda, Aurélie. (2018). Processes for preventing oxidation of metal thin films (U.S. Patent No. 9947582). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9947582

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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