The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Jul. 11, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daisuke Domon, Jyoetsu, JP;
Satoshi Watanabe, Jyoetsu, JP;
Keiichi Masunaga, Jyoetsu, JP;
Masaaki Kotake, Jyoetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 216/10 (2006.01); G03F 1/78 (2012.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/38 (2006.01);
U.S. Cl.
CPC ...
C08F 216/10 (2013.01); C08F 220/38 (2013.01); G03F 1/78 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/093 (2013.01); G03F 7/2059 (2013.01); G03F 7/322 (2013.01);
Abstract
A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), wherein Mrepresents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b), This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity.