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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9941244 B1

PDFFull Text
Date of Patent:
Apr. 10, 2018

Filed:

Dec. 09, 2013

Protective layer for contact pads in fan-out interconnect structure and method of forming same

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chin-Chuan Chang, Zhudong Township, TW;

Tsei-Chung Fu, Toufen Township, TW;

Jing-Cheng Lin, Chu Tung Zhen, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Phat X Cao

Assistant Examiner:

Diana C Vieira

Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 23/522 (2006.01); H01L 21/56 (2006.01);
U.S. Cl.
CPC ...
H01L 24/96 (2013.01); H01L 23/3185 (2013.01); H01L 23/5226 (2013.01); H01L 24/19 (2013.01); H01L 21/561 (2013.01); H01L 21/568 (2013.01); H01L 24/13 (2013.01); H01L 24/16 (2013.01); H01L 2224/0239 (2013.01); H01L 2224/02381 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/05018 (2013.01); H01L 2224/05124 (2013.01); H01L 2224/05144 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/05569 (2013.01); H01L 2224/05572 (2013.01); H01L 2224/05647 (2013.01); H01L 2224/05666 (2013.01); H01L 2224/12105 (2013.01); H01L 2224/13111 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/16145 (2013.01); H01L 2224/16225 (2013.01); H01L 2224/94 (2013.01); H01L 2924/12042 (2013.01); H01L 2924/14 (2013.01); H01L 2924/181 (2013.01); H01L 2924/18162 (2013.01);
Abstract

In accordance with a method embodiment includes providing a die having a contact pad on a top surface and forming a conductive protective layer over the die and covering the contact pad. A molding compound is formed over the die and the conductive protective layer. The conductive protective layer is exposed using a laser drilling process. A redistribution layer (RDL) is formed over the die. The RDL is electrically connected to the contact pad through the conductive protective layer.

Find Patent Forward Citations

Chang, Chin-Chuan. (2018). Protective layer for contact pads in fan-out interconnect structure and method of forming same (U.S. Patent No. 9941244). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9941244

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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