The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Oct. 16, 2014
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Masaaki Ito, Tokyo, JP;

Hisashi Hatano, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8803 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G06T 7/001 (2013.01); G01N 21/8851 (2013.01); G06T 2207/30148 (2013.01);
Abstract

When a size of a block on a wafer is equal to or smaller than an optical resolution of imaging optics, room for improvement in a signal-to-noise ratio has not been sufficiently considered in a conventional technique. One feature of the defect determination of the present invention is to include a filter processing for setting a predetermined partial area serving as a predetermined matrix for a first difference image, scanning the first difference image in the partial area, and outputting a second difference image, and a first threshold processing using a first threshold value for the second difference image. As a result, highly sensitive defect detection can be achieved.


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