The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Jun. 23, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kazuki Yamada, Nirasaki, JP;

Masato Morishima, Nirasaki, JP;

Kenji Ouchi, Nirasaki, JP;

Taiki Katou, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); H01J 37/32 (2006.01); C23C 16/36 (2006.01); C23C 16/507 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/36 (2013.01); C23C 16/507 (2013.01); H01J 37/3211 (2013.01); H01J 37/3244 (2013.01); H01J 37/32174 (2013.01); H01L 51/5256 (2013.01);
Abstract

There is provided a method of forming a sealing film to seal a device formed on a substrate, including: supplying a mixture gas including a silicon-containing gas and a halogen element-containing gas or a mixture gas including a silicon-containing gas and a gas containing a functional group having an electronegative property stronger than that of nitrogen, as a first mixture gas, into a processing container; generating plasma of the first mixture gas within the processing container; and forming a first sealing film to cover the device using the first mixture gas activated by the plasma.


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