The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Sep. 16, 2016
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Chia-Ping Chiang, Taipei, TW;
Ya-Ting Chang, Nantou County, TW;
Wen-Li Cheng, Taipei, TW;
Nian-Fuh Cheng, Hsinchu, TW;
Ming-Hui Chih, Taipei County, TW;
Wen-Chun Huang, Tainan, TW;
Ru-Gun Liu, Hsinchu County, TW;
Tsai-Sheng Gau, HsinChu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsin-Chu, TW;
Abstract
A method of manufacturing an integrated circuit (IC) includes receiving a design layout of the IC, wherein the design layout includes two abutting blocks, the two blocks include target patterns, and the target patterns have different pitches in the two blocks. The method further includes generating mandrel pattern candidates in spaces between adjacent target patterns, and assigning first and second colors to the mandrel pattern candidates according to their priorities. The method further includes removing the mandrel pattern candidates assigned with the second color, and outputting a mandrel pattern in computer-readable format for mask fabrication. The mandrel pattern includes the mandrel pattern candidates that are colored with the first color.