The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2018

Filed:

May. 06, 2016
Applicant:

Lam Research Ag, Villach, AT;

Inventors:

Hongbo Si, Villach, AT;

Bhaskar Bandarapu, Villach, AT;

Andreas Gleissner, Dobriach, AT;

Bernhard Loidl, Villach, AT;

Assignee:

LAM RESEARCH AG, Villach, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); B05C 13/00 (2006.01); G03F 7/16 (2006.01); B05C 9/14 (2006.01); B05C 5/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); B05C 13/00 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); H01L 21/67115 (2013.01); B05C 5/0208 (2013.01); B05C 9/14 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/67178 (2013.01); Y10S 134/902 (2013.01);
Abstract

In an apparatus for treating a wafer-shaped article, a spin chuck is configured to hold a wafer-shaped article of a predetermined diameter. A non-rotating plate is positioned relative to the spin chuck such that the non-rotating plate is beneath and parallel to a wafer-shaped article when positioned on the spin chuck. A fluid dispensing nozzle passes through the non-rotating plate and terminates in a discharge end positioned above and adjacent to the non-rotating plate. The discharge end comprises a horizontal gas discharge nozzle configured to distribute gas radially outwardly across an upper surface of the non-rotating plate.


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