The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2018

Filed:

Sep. 08, 2015
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Shohei Tagami, Annaka, JP;

Michihiro Sugo, Takasaki, JP;

Masahito Tanabe, Annaka, JP;

Hideto Kato, Takasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/683 (2006.01); B32B 7/12 (2006.01); C09J 183/04 (2006.01); C09J 183/14 (2006.01); B32B 7/06 (2006.01); C09J 183/06 (2006.01); C08G 77/00 (2006.01); C08G 77/52 (2006.01); C08G 77/50 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6835 (2013.01); B32B 7/06 (2013.01); B32B 7/12 (2013.01); C09J 183/04 (2013.01); C09J 183/06 (2013.01); C09J 183/14 (2013.01); B32B 2405/00 (2013.01); B32B 2457/14 (2013.01); C08G 77/50 (2013.01); C08G 77/52 (2013.01); C08G 77/70 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68318 (2013.01); H01L 2221/68327 (2013.01); H01L 2221/68381 (2013.01); H01L 2221/68386 (2013.01);
Abstract

A wafer processing laminate including a support, a temporary adhesive material layer formed on the support, and a wafer laminated on the temporary adhesive material layer, the wafer having a circuit-forming front surface and back surface to be processed, wherein the temporary adhesive material layer includes a complex temporary adhesive material layer having two-layered structure including a first temporary adhesive layer composed of a thermoplastic organopolysiloxane polymer layer (A) having a film thickness of less than 100 nm and a second temporary adhesive layer composed of a thermosetting siloxane-modified polymer layer (B), the first temporary adhesive layer being releasably laminated to the front surface of the wafer, the second temporary adhesive layer being releasably laminated to the first temporary adhesive layer and the support. A temporary adhesive material for a wafer processing which withstand a thermal process at high temperature exceeding 300° C., facilitating temporary adhesion and delamination.


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