The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2018

Filed:

Dec. 19, 2013
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventor:

Takahiro Jingu, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/93 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01N 21/93 (2013.01); G01N 2201/127 (2013.01);
Abstract

An inspection apparatus which can be accurately calibrated regardless of a use environment or an amount of use time is implemented. A reference substrateprovided with a diffraction gratingis mounted on a transport system, an illumination regionis formed on the diffraction gratingby lightfrom an illumination optical system, reflected light is collected by a detection optical system, and an output value from a sensoris measured. It is determined whether or not a difference between a simulation value preserved in a processing sectionand the output value from the sensoris within a predetermined allowable range, and the optical system is adjusted so that the difference enters the allowable range. Since standard data for performing calibration on the inspection apparatus is obtained by using the diffraction grating, it is possible to implement the inspection apparatus which can be accurately calibrated regardless of a use environment or an amount of use time.


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