The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

Oct. 24, 2016
Applicants:

Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;

Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;

Inventors:

Lian Guo Zhao, Shanghai, CN;

Kun Peng, Shanghai, CN;

Xiang Hu, Shanghai, CN;

Hai Lian Wang, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03K 19/00 (2006.01); H03K 19/003 (2006.01); H01L 23/00 (2006.01); H04L 9/32 (2006.01); G09C 1/00 (2006.01);
U.S. Cl.
CPC ...
H03K 19/0005 (2013.01); G09C 1/00 (2013.01); H01L 23/576 (2013.01); H03K 19/003 (2013.01); H04L 9/3278 (2013.01); H04L 2209/12 (2013.01);
Abstract

The present disclosure provides physically unclonable products and fabrication methods thereof. An exemplary fabrication method forming a resistor block; performing a resistance randomizing process to the resistor block to cause the resistor block to have a random resistance; forming a resistor block array using at least two resistor blocks obtained after the resistance randomizing process; and coupling at least one resistor block array with a product to form the physically unclonable product.


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