The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Sep. 21, 2016
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventor:
Dennis M. Hausmann, Lake Oswego, OR (US);
Assignee:
Lam Research Coporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/16 (2013.01); H01L 45/06 (2013.01); H01L 45/065 (2013.01); H01L 45/12 (2013.01); H01L 45/126 (2013.01); H01L 45/1233 (2013.01); H01L 45/1293 (2013.01); H01L 45/142 (2013.01); H01L 45/143 (2013.01); H01L 45/144 (2013.01);
Abstract
Methods of depositing silicon nitride encapsulation layers by atomic layer deposition over memory devices including chalcogenide material are provided herein. Methods include using iodine-containing and/or bromine-containing silicon precursors and depositing thermally using ammonia or hydrazine as a second reactant, or iodine-containing and/or bromine-containing silicon precursors and depositing using a nitrogen-based or hydrogen-based plasma.
Published as:
US9601693B1; US2017092857A1; US2017092856A1; KR20170039567A; JP2017092455A; TW201723216A; US9865815B2; US2018114903A1; US10141505B2; JP6918460B2; TWI776792B; KR102637938B1;
Hausmann, Dennis. (2018). Bromine containing silicon precursors for encapsulation layers (U.S. Patent No. 9865815). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9865815
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile