The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Jul. 10, 2016
Applicant:
Plasma-therm Llc, St. Petersburg, FL (US);
Inventors:
Sarpangala H. Hegde, Fremont, CA (US);
VIncent Lee, Fremont, CA (US);
Assignee:
PLASMA-THERM NES LLC, St. Petersburg, FL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); H01J 37/32 (2006.01); C23C 16/505 (2006.01); C23C 16/27 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32633 (2013.01); C23C 16/272 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32422 (2013.01); H01J 37/32458 (2013.01); H01L 21/67069 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3321 (2013.01);
Abstract
The present invention provides a charged particle source comprising a plasma processing chamber that has a plasma source, a gas supply and an ion extraction grid that are each operatively connected to the processing chamber. A conducting plate is located adjacent to a wall of the plasma source. The conducting plate has a surface with a plurality of grooves that face the wall of the plasma source. A substrate support is disposed within an interior portion of the processing chamber for supporting a substrate.