The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Apr. 27, 2015
Applicant:
Plasma-therm Nes Llc, St. Petersburg, FL (US);
Inventors:
Assignee:
Plasma-Therm NES LLC, St. Petersburg, FL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23P 11/00 (2006.01); C23C 14/50 (2006.01); C23C 14/22 (2006.01); H01J 37/30 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 14/221 (2013.01); H01J 37/20 (2013.01); H01J 37/30 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/20228 (2013.01); H01J 2237/3142 (2013.01); H01J 2237/3151 (2013.01);
Abstract
A planetary arm coupled to a tilt actuator moves a wafer in oscillatory motion along an arcuate path to expose a surface of the wafer to an incident ion beam for deposition and/or etching processing of thin film structures on the surface of the wafer. A wafer holder on an end of the planetary arm may be driven in rotation while the planetary arm executes oscillatory motion at a selected tilt angle relative to an incident ion beam. A slit support plate provides controllable exposure of the wafer to the incident beam. Embodiments are suitable for use in wafer deposition machines and/or wafer etching machines.