The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2018

Filed:

Dec. 24, 2014
Applicant:

Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;

Inventors:

Haijun Song, Shanghai, CN;

Kan Lu, Shanghai, CN;

Feibiao Chen, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7026 (2013.01); G03F 9/7034 (2013.01);
Abstract

A focusing and leveling apparatus, including: an illumination light source () for emanating a light beam; an illumination lens group (), a projecting unit, an object () being measured, a detecting unit, a refractive unit, a relay lens group and a photoelectric detector (), disposed sequentially in this order in a transmission path of the light beam. The projecting unit includes projection slits () defining a plurality of non-linearly arranged marks, such that after passing sequentially through the illumination lens group (), the projecting unit, the object () being measured and the detecting unit, the light beam emanated by the illumination light source () becomes a plurality of non-linearly arranged sub-beams corresponding to the plurality of marks. The refractive unit is so configured that after passing through the refractive unit, the plurality of sub-beams form a plurality of linearly arranged light spots.


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