The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2017

Filed:

Mar. 29, 2017
Applicant:

Cypress Semiconductor Corporation, San Jose, CA (US);

Inventors:

Sung-Taeg Kang, Palo Alto, CA (US);

James Pak, Sunnyvale, CA (US);

Unsoon Kim, San Jose, CA (US);

Inkuk Kang, San Jose, CA (US);

Chun Chen, San Jose, CA (US);

Kuo-Tung Chang, Saratoga, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 27/11565 (2017.01); H01L 27/11521 (2017.01); H01L 27/11526 (2017.01); H01L 27/11519 (2017.01); H01L 29/423 (2006.01); H01L 27/11568 (2017.01); H01L 27/11573 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11565 (2013.01); H01L 27/11519 (2013.01); H01L 27/11521 (2013.01); H01L 27/11526 (2013.01); H01L 27/11568 (2013.01); H01L 27/11573 (2013.01); H01L 29/42328 (2013.01); H01L 29/42344 (2013.01);
Abstract

A semiconductor device including a non-volatile memory (NVM) cell and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed on a logic region of a substrate, and the NVM cell integrally formed in a first recess in a memory region of the same substrate, wherein the first recess is recessed relative to a first surface of the substrate in the logic region. Generally, the metal-gate logic transistor further including a planarized surface above and substantially parallel to the first surface of the substrate in the logic region, and the NVM cell is arranged below an elevation of the planarized surface of the metal-gate. In some embodiments, logic transistor is a High-k Metal-gate (HKMG) logic transistor with a gate structure including a metal-gate and a high-k gate dielectric. Other embodiments are also disclosed.


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