The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Feb. 03, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Paul Brillhart, Pleasanton, CA (US);
Anzhong Chang, San Jose, CA (US);
Edric Tong, Sunnyvale, CA (US);
Kin Pong Lo, Fremont, CA (US);
James Francis Mack, Woodside, CA (US);
Zhiyuan Ye, San Jose, CA (US);
Kartik Shah, Sunnyvale, CA (US);
Errol Antonio C. Sanchez, Tracy, CA (US);
David K. Carlson, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Joseph M. Ranish, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments provided herein generally relate to an apparatus for delivering gas to a semiconductor processing chamber. An upper quartz dome of an epitaxial semiconductor processing chamber has a plurality of holes formed therein and precursor gases are provided into a processing volume of the chamber through the holes of the upper dome. Gas delivery tubes extend from the holes in the dome to a flange plate where the tubes are coupled to gas delivery lines. The gas delivery apparatus enables gases to be delivered to the processing volume above a substrate through the quartz upper dome.