The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Dec. 21, 2016
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Marina Yamaguchi, Yokkaichi, JP;

Shosuke Fujii, Kuwana, JP;

Masumi Saitoh, Yokkaichi, JP;

Hiromichi Kuriyama, Kuwana, JP;

Takuya Konno, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01); H01L 45/00 (2006.01); H01L 27/24 (2006.01); G11C 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1206 (2013.01); G11C 13/0004 (2013.01); G11C 13/0007 (2013.01); G11C 13/0097 (2013.01); H01L 27/2436 (2013.01); H01L 45/085 (2013.01); H01L 45/1273 (2013.01); H01L 45/141 (2013.01); H01L 45/165 (2013.01);
Abstract

According to one embodiment, a semiconductor memory device includes a semiconductor layer, a gate electrode, a metal containing portion, and an insulating portion. The semiconductor layer includes a first region and a second region. The second region has at least one of a region being amorphous or a region having a crystallinity lower than a crystallinity of the first region. The gate electrode is apart from the first region in a first direction. The first direction crosses a second direction connecting the first region and the second region. The metal containing portion is apart from the second region in the first direction. At least a part of the metal containing portion overlaps the gate electrode in the second direction. The insulating portion is provided between the gate electrode and the first region and between the metal containing portion and the second region.


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