The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2017

Filed:

Oct. 20, 2014
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Yi Lu, Singapore, SG;

Dongli Wang, Singapore, SG;

Deyan Chen, Hubei, CN;

Purakh Raj Verma, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/762 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4236 (2013.01); H01L 21/76229 (2013.01); H01L 21/76232 (2013.01); H01L 29/66704 (2013.01); H01L 29/7825 (2013.01); H01L 29/0653 (2013.01); H01L 29/1087 (2013.01); H01L 29/42368 (2013.01);
Abstract

Integrated circuits with improved laterally diffused metal oxide semiconductor (LDMOS) structures, and methods of fabricating the same, are provided. An exemplary LDMOS integrated circuit includes an n-type reduced surface field, a p-type body well disposed on a lateral side of the n-type reduced surface field region, a shallow trench isolation structure disposed within the n-type reduced surface field region, and a gate structure disposed partially over the p-type body well, partially over the n-type reduced surface field region, partially over the shallow trench isolation structure, and partially within the shallow trench isolation structure.


Find Patent Forward Citations

Loading…