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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9835954 B1

PDFFull Text
Date of Patent:
Dec. 05, 2017

Filed:

May. 02, 2014

Inspection method and apparatus, substrates for use therein and device manufacturing method

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Erik Willem Bogaart, Eindhoven, NL;

Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;

Arie Jeffrey Den Boef, Waalre, NL;

Simon Gijsbert Josephus Mathijssen, Den Bosch, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Sterne, Kessler, Goldstein & Fox P.L.L.C.

Primary Examiner:

Mark R Gaworecki

Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01N 21/95 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); G01N 21/65 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70483 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G03F 7/70625 (2013.01); G01N 2021/656 (2013.01);
Abstract

A substrate is provided with device structures and metrology structures (). The device structures include materials exhibiting inelastic scattering of excitation radiation of one or more wavelengths. The device structures include structures small enough in one or more dimensions that the characteristics of the inelastic scattering are influenced significantly by quantum confinement. The metrology structures () include device-like structures () similar in composition and dimensions to the device features, and calibration structures (). The calibration structures are similar to the device features in composition but different in at least one dimension. Using an inspection apparatus and method implementing Raman spectroscopy, the dimensions of the device-like structures can be measured by comparing spectral features of radiation scattered inelastically from the device-like structure and the calibration structure.

Find Patent Forward Citations

Bogaart, Erik. (2017). Inspection method and apparatus, substrates for use therein and device manufacturing method (U.S. Patent No. 9835954). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9835954

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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