The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Aug. 31, 2015
Mitutoyo Corporation, Kanagawa, JP;
Robert Kamil Bryll, Bothell, WA (US);
Mitutoyo Corporation, Kanagawa-ken, JP;
Abstract
A method is provided for defining operations for acquiring a multi-exposure image of a workpiece including first and second regions of interest at different Z heights. The multi-exposure image is acquired by a machine vision inspection system including strobed illumination and a variable focal length lens (e.g., a tunable acoustic gradient index of refraction lens) used for periodically modulating a focus position. During a learn mode, first and second multi-exposure timing values for instances of strobed illumination are determined that correspond with first and second phase timings of the periodically modulated focus position that produce sufficient image focus for the first and second regions of interest. Data indicative of the multi-exposure timing difference is recorded and is subsequently utilized (e.g., during a run mode) to define operations for acquiring a multi-exposure image of first and second regions of interest on a current workpiece that is similar to the representative workpiece.