The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Mar. 16, 2012
Applicants:

Osamu Hirakawa, Koshi, JP;

Masaru Honda, Koshi, JP;

Xavier Francois Brun, Chandler, AZ (US);

Charles Wayne Singleton, Jr., Chandler, AZ (US);

Inventors:

Osamu Hirakawa, Koshi, JP;

Masaru Honda, Koshi, JP;

Xavier Francois Brun, Chandler, AZ (US);

Charles Wayne Singleton, Jr., Chandler, AZ (US);

Assignees:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 38/10 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); B32B 43/00 (2006.01);
U.S. Cl.
CPC ...
B32B 38/10 (2013.01); B32B 43/006 (2013.01); H01L 21/6715 (2013.01); H01L 21/67092 (2013.01); H01L 21/67109 (2013.01); H01L 21/67748 (2013.01); B32B 2457/14 (2013.01); Y10T 156/1137 (2015.01); Y10T 156/1153 (2015.01); Y10T 156/1189 (2015.01); Y10T 156/1911 (2015.01); Y10T 156/1939 (2015.01); Y10T 156/1972 (2015.01);
Abstract

A separation apparatus for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive, into the processing target substrate and the supporting substrate includes: a first holding unit that includes a heating mechanism heating the processing target substrate and holds the processing target substrate; a second holding unit that includes a heating mechanism heating the supporting substrate and holds the supporting substrate; a moving mechanism that relatively moves at least the first holding unit or the second holding unit in a horizontal direction; and a porous part that is annularly provided along an outer peripheral portion of the first holding unit and formed with a plurality of pores, and supplies an inert gas to the outer peripheral portion of the first holding unit holding the processing target substrate.


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